Question Bank MCQ • 2 Marks Section 8: Electronics Semiconductor Devices & Diodes

QB_PH_SEC8_019: Semiconductor Devices & Diodes

Question Statement

In an enhancement-mode n-channel MOSFET (NMOS), conducting inversion layer channel formation between source and drain requires a gate-to-source voltage $V_{\text{GS}}$ that is
(A) Positive and strictly greater than the threshold voltage $V_{\text{th}}$ ($V_{\text{GS}} > V_{\text{th}} > 0$)
(B) Negative and less than the pinch-off voltage ($V_{\text{GS}} < V_P < 0$)
(C) Identically zero ($V_{\text{GS}} = 0$)
(D) Arbitrary, since enhancement MOSFETs are normally-ON devices
Correct Answer
A
Verified Key

Step-by-Step KaTeX Derivation & Detailed Explanation

### Step-by-Step Derivation & Verification: 1. **Enhancement Device Physics**: Built on a p-type silicon substrate with two heavily doped $n^+$ regions (source and drain). 2. **Equilibrium State ($V_{\text{GS}} = 0$)**: Two back-to-back $p-n$ junctions isolate drain from source; zero current flows (normally-OFF). 3. **Channel Inversion**: When a positive gate voltage $V_{\text{GS}} > 0$ is applied, holes are repelled from the interface. When $V_{\text{GS}}$ exceeds the positive threshold voltage $V_{\text{th}}$, the surface potential reaches $2\phi_F$ (strong inversion), accumulating an electron inversion layer bridging source and drain. 4. **Conclusion**: Requires $V_{\text{GS}} > V_{\text{th}} > 0$. Option (A) is correct.
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